​강정원 (Jungwon Kang)

• 연구실: 2공학관 312호

• 전   화: 031-8005-3646

• E-mail:

• 학사 1990. 고려대학교 전자공학과

• 석사 1994. University of Arizona, Electrical Engineering

• 박사 1997. Unuversity of Arizona, Electrical Engineering

• Flat Panel Display Area
   - Development of High Efficiency PDPs
   - Development of High Speed Driving Methods and Cell Structures
   - Other Applications for Flat Panel Display
   

• Semiconductor and Processing Area
   - Giga DRAM Process Development
   - Plasma Damage and Curing
   - Plasma Parameter Studies: With LLS(Laser Light Scattering), Electrical
   - Probe, OES and RGA, Studies about Plasma Parameters
   - Contaminant Particle Studies

• 평판디스플레이 중 고효율 고속구동 Plasma Display

• 기타 평판디스플레이 (Evaluation and Process Issues)

• Plasma Application (Process, Light Source and etc.)

• Research Associate: SEMATECH center (1992-97)

• 선임연구원: LG 반도체(현, 하이닉스) 중앙연구소 (1997-98)

• 책임연구원: LG 전자 Display 연구소 (1998-2003)

• 연구교수: 일본 Kyoto 대학교 전자과학공학과 (2001-02)

• 외부강사: 고려대학교 전자공학과 대학원 (2000)

• 2009.08 <Glycerol-Doped Poly(3,4-ethylenedioxy-thiophene):Poly(styr ene sulfonate) Buffer Layer for Improved Power Conversion in Organic Pgotovoltaic Devices>

• 2009.08 <Full-HD LCOS Panel의 Cell Gap의 변화에 따른 전기광학적 특성에 대한 연구>

• 2009.03 <ac PDP에서의 Reset과 Address 구간에서 Negative Waveform 특성에 관한 연구>

• 2008.09 <VA mode의 LCOS에서 Cell Gap의 변화에 따른 전기광학적 틍성>

• 2008.08 <Plasma Display의 최신 기술 동향>

• 2007.06 <Multi-cube UV Source를 이용한 PDP에서 광학시뮬레이션의 정확성 개선에 관한 연구>

• 2007.02 <Hybrid Passivation for a Film-like Organic Light-Emitting Diode using Parylene and Silicon Dioxide>

• 2006.09 <Effects of Kr. N2, and Ar on Address Discharge Time Lag in AC Plasma-Display Panel With High Xenon Content>

• 2006.06 <광학 시뮬레이션을 통한 PDP Cell 구조의 최적화>

• 2006.06 <ac PDP에서 Addressing 특성개선을 취한 negative ramp slope이 적용된 reset pulse에 대한 연구>

• 2006.04 <Effect of Bus Electrode Position in a High Resolution AC Plasma Display Panel with High Xe Include Gas Mixture>

• 2005.05 <Improvement of Luminous Efficacy and Driving Characteristics in ac Plasma Display by Changing the Bus Position>

• 2005.03 <Real Time Face Detection with TS Algorithm in Mobile Display>

• 2005.02 <Discharge Characteristics of an In-Bus Structure with a High Xe Gas Mixture>

• 2004.12 <PDP의 Address 특성 개선에 관한 고찰>

• 2004.12 <Current Status and Technology of Plasma Displays>

• 2003.12 <Characteristics of In-Bus structure with high Xe mixture gases>

• 2003.12 <Characteristics and diagnostics of horizontal long-column Plasma display>

• 2003.06 <Characteristics and diagnostics of horizontal long-column displays>

• 2003.06 <Characteristics of plasma display with rf microdischarge>

• 2003.05 <Characteristics of plasma display with rf microdischarge>

• 2003.05 <Characteristics of high efficient in-bus structure with high Xe mixture gases>

• 2003.02 <Characteristics of horizontal long column plasma display>

• 2003.02 <Numerical analysis of discharge using FEM-FCT on unstructured grid>

• 2002.12 <Calculated charateristics of rf plasma display panel cells including the influence of xenon metastables>

• 2002.07 <Numerical analysis of transient state plasma using FEM-FCT on unstructured grid>

• 2001.08 <Luminance and luminance efficiency of radio frequency excited plasma display>

• 2001.08 <Progress in understanding and optimizing PDP discharge>

• 2001.06 <Software-based analysis of radio frequency plasma display panel for efficient design and impedance matching>

• 2000.12 <Characteristics of In-bus structure with high Xe mixture gases>

• 2000.12 <Discharge characteristics of Ne+Xe+N2 gas mixture>

• 2000.12 <Panel performance of rf PDP>

• 2000.12 <Improvement of emission characteristics in PDPs driven by RF pulse>

• 2000.09 <High luminance and luminance efficiency in PDPs driven by radio frequency pulse>

• 2000.02 <Development of high efficiency PDP driven by RF pulses>

• 2000.01 <Improvement of Emission Characteristics in PDPs by Radio Frequency Discharges>

• 1999.12 <Improvement of Luminance and Luminance efficiency in PDPs driven by radio frequency pulses>

• 1999.09 <Efficiency of radio frequency excited plasma-displays calls model predictions>

• 1998.02 <The analysis of etch characteristic in high density oxide etcher>

• 1996.05 <An rf compensated emissive probe>

• 1996.04 <Mapping of rf plasma potential throughout a particle trapping region using an emissive probe>

• 1994.04 <The effects of electrostatic, molecular drag and gravitational forces on the behavior of particle clouds in an rf discharge>

• 1994.02 <The behavior of particle clouds near vertically oriented wafers in a capacitively>

• 1994.01 <Particle trap near wafers pointing upward, downward and sidewise>